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サンプルMAXサイズ10mm口！耐熱、断熱セラミック研究用途でご利用いただけます
『レーザーCVD装置』は、CO2レーザーをあてながらCVD成膜する 装置です。 600℃までヒーター加熱。チャンバーサイズは、φ300 × 300Hです。 耐熱、断熱セラミック研究用途でご利用いただけます。 【仕様】 ■サンプルMAXサイズ10mm口 ■600℃までヒーター加熱 ■RPにて排気、MAX 5Pa ■O2 x 1 Ar x 4系統 MFC仕様 ■φ300 x 300H チャンバーサイズ ※詳しくは外部リンクページをご覧いただくか、お気軽にお問い合わせ下さい。
Easily set up the sample! You can introduce the YAG laser from the external viewport to perform film deposition.
This product is a CVD device that allows film formation by introducing a YAG laser from an external viewport, with a sample stage (equipped with an automatic rotation mechanism) located at the center of a high-frequency heating coil. The sample inlet is located on the side of the chamber and can be opened and closed from both sides, making it easy to set the sample. It is also possible to install a gas supply system (up to 5 systems) at the top of the chamber as an option. 【Features】 ■ Film formation can be achieved by introducing a YAG laser from an external viewport ■ The sample inlet is located on the side of the chamber and can be opened and closed from both sides ■ Easy sample setup ■ Option to install a gas supply system (up to 5 systems) at the top *For more details, please refer to the external link page or feel free to contact us.
